The HALIDES are useful as starting materials for production by thermal evaporation of transparent thin-film interference coatings, which improve the optical characteristics of workpieces made of glass, quartz, single crystals, semiconductors, etc.
     Used for deposition of mono- and multilayer optical coatings, they are effective in ultraviolet, visible and infrared spectral regions. Halides, fluorides in particular, is the most early class of film-forming materials, used as one of the first as thin-film dielectric antireflecting coatings in optics.
     Antireflective (AR) coatings reduce reflections and ghost images while enhancing the transmission of light. This is especially important when a large number of surfaces are used, as in microscopes, camera lenses or endoscopes. Besides antireflective coatings, a wide range of applications are served in the UV, visible and infrared range, in lighting systems, laser technology, projection systems, and even in medical applications such as mirrors, band-pass filters for information technology, conductive coatings for avionics displays, and more.
     The FLUORIDE film-forming materials are deliverable in the form of tablets or granules, based on high-pure fluorides of alkali, alkali-earth and other metal compounds, and in case of cesium iodide in form of boules. PVD processing is carried out in high vacuum at temperatures between 150 and 500 °C.

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